Company Filing History:
Years Active: 2012
Title: Innovations by Inventor Stephan Hoffmann
Introduction
Stephan Hoffmann is a notable inventor based in Fremont, CA. He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of low-k dielectric film layers. With a total of 2 patents to his name, Hoffmann's work has advanced the technology used in the industry.
Latest Patents
Hoffmann's latest patents include a method for removing damaged low-k dielectric film layers. This innovative approach involves identifying a control chemistry that selectively removes damaged material from the film layer. The method establishes process parameters to ensure that the damaged material is effectively removed while preserving the integrity of the surrounding features.
Another significant patent is for an apparatus designed for isolated bevel edge cleaning. This system utilizes a bristle brush unit that cleans substrate edges by employing frictional contact with cleaning chemistry. The design includes outwardly extending vanes and abrasive materials that work together to remove bevel polymers from the substrate edges efficiently.
Career Highlights
Stephan Hoffmann is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His work at Lam Research has allowed him to focus on innovative solutions that enhance manufacturing processes.
Collaborations
Hoffmann has collaborated with several talented individuals, including Mark Henry Wilcoxson and Hyungsuk Alexander Yoon. These collaborations have contributed to the development of advanced technologies in the semiconductor field.
Conclusion
Stephan Hoffmann's contributions to the semiconductor industry through his patents and work at Lam Research Corporation highlight his role as an influential inventor. His innovative methods for handling low-k dielectric film layers and substrate cleaning continue to impact the field positively.