The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2012
Filed:
May. 13, 2009
Arnold Kholodenko, San Francisco, CA (US);
Katrina Mikhaylichenko, San Jose, CA (US);
Cheng-yu (Sean) Lin, Sunnyvale, CA (US);
Mark Wilcoxson, Oakland, CA (US);
Leon Ginzburg, Santa Clara, CA (US);
Mark Kawaguchi, Sunnyvale, CA (US);
Arnold Kholodenko, San Francisco, CA (US);
Katrina Mikhaylichenko, San Jose, CA (US);
Cheng-Yu (Sean) Lin, Sunnyvale, CA (US);
Mark Wilcoxson, Oakland, CA (US);
Leon Ginzburg, Santa Clara, CA (US);
Mark Kawaguchi, Sunnyvale, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A first application of a cleaning material is made to a surface of a substrate. The cleaning material includes one or more viscoelastic materials for entrapping contaminants present on the surface of the substrate. A first application of a rinsing fluid is made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate. The first application of the rinsing fluid is also performed to leave a residual thin film of the rinsing fluid on the surface of the substrate. A second application of the cleaning material is made to the surface of the substrate having the residual thin film of rinsing fluid present thereon. A second application of the rinsing fluid is then made to the surface of the substrate so as to rinse the cleaning material from the surface of the substrate.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile