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For the Inventor, By the Inventor

Lincoln, MA, United States of America

Marcie R Black

This inventor holds 29 USPTO granted patents and 17 published patent applications and 1 EPO patent, primarily in Silicon Nanostructures. Top assignees: Advanced Silicon Group, Inc., Bandgap Engineering, Inc., Los Alamos National Security, LLC. Active years: 2011-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Marcie R Black. Retrieved from https://idiyas.com/inventor/marcie-r-black

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 29 

% Patents Active = 62.1

 

Average Co-Inventor Count = 3.1

ph-index = 4

Forward Citations = 66(Granted Patents)


Location History:

  • Newton, MA (US) (2011)
  • Woburn, MA (US) (2015)
  • Salem, NH (US) (2015 - 2018)
  • Lincoln, MA (US) (2011 - 2023)

Company Filing History:

goldMedal13 out of 13 
 
Advanced Silicon Group, Inc.
 patents
silverMedal9 out of 9 
 
Bandgap Engineering, Inc.
 patents
bronzeMedal4 out of 576 
 
Los Alamos National Security, LLC
 patents
4. 1 out of 1 
 
Advanced Silicon Group Technologies, LLC
 patent
5. 1 out of 129 
 
Leidos, Inc.
 patents
6. 1 out of 834,453 
Other
 patents

Years Active: 2011-2025

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Areas of Expertise:
Ultrahigh Temperature Sensors
Nanotextured Silicon
Biosensors
Nanowire Arrays
Metal-Assisted Etch
Electrical Contacts
Optoelectronic Devices
Silver Films
Silicon Anodes
High-Aspect Ratio Components
Nanostructured Devices
Functionalized Textiles
29 patents (USPTO):Explore Patents
1. 12320709 - Embeddable ultrahigh temperature sensors and method for making (2025-06-03),
2. 11585807 - Nanotextured silicon biosensors (2023-02-21),
3. 11355584 - Process for fabricating silicon nanostructures (2022-06-07),
4. 10692971 - Process for fabricating silicon nanostructures (2020-06-23),
5. 10629759 - Metal-assisted etch combined with regularizing etch (2020-04-21),
6. 10269995 - Screen printing electrical contacts to nanostructured areas (2019-04-23),
7. 10079322 - Necklaces of silicon nanowires (2018-09-18),
8. 9911878 - Metal-assisted etch combined with regularizing etch (2018-03-06),
9. 9859366 - Process for fabricating silicon nanostructures (2018-01-02),
10. 9783895 - Double-etch nanowire process (2017-10-10),
11. 9768331 - Screen printing electrical contacts to nanowire areas (2017-09-19),
12. 9601640 - Electrical contacts to nanostructured areas (2017-03-21),
13. 9449855 - Double-etch nanowire process (2016-09-20),
14. 9202868 - Process for fabricating nanowire arrays (2015-12-01),
15. 9136410 - Selective emitter nanowire array and methods of making same (2015-09-15),

Title: The Innovative Mind of Marcie R Black

Introduction: Marcie R Black, a talented inventor based in Lincoln, MA (US), is known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Marcie R Black has recently been granted several patents for his cutting-edge inventions in the realm of artificial intelligence and renewable energy technologies.

Career Highlights: With a career spanning over two decades, Marcie R Black has established himself as a visionary inventor with a keen eye for identifying gaps in the market and developing innovative solutions to address them. His work has not only revolutionized industries but has also improved the lives of many around the world.

Collaborations: Throughout his career, Marcie R Black has collaborated with leading research institutions, universities, and tech companies to bring his inventions to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of many of his projects.

Conclusion: Marcie R Black's passion for innovation, coupled with his relentless drive to push the boundaries of what is possible, has solidified his reputation as a trailblazer in the world of inventions. His work continues to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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