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1 out of 26 Years Active: 2018-2025
Title: Leijie Wang: Innovator in Heterodyne Grating Interferometry and Scanning Lithography
Introduction
Leijie Wang is a prominent inventor based in Beijing, China. With a remarkable portfolio consisting of 12 patents, he has made significant contributions to the fields of optical technology and photolithography. His innovative approaches have advanced the understanding and applications of interference systems in various engineering and scientific domains.
Latest Patents
Wang's latest patents include two notable inventions. The first is a Heterodyne Grating Interferometry System Based on Secondary Diffraction. This system incorporates a single-frequency laser and various components such as an acousto-optic modulator, photoelectric conversion unit, and measurement grating. It allows for the generation of precise optical signals, converting them into electrical signals crucial for accurate measurements.
The second patent is a Scanning Interference Lithographic System. This system features a complex optical path setup designed for interference exposure on substrates. By using a motion platform and a control subsystem that adjusts the phases of light beams, the system demonstrates high precision in fringe pattern locking, making it suitable for creating dense grating patterns on a large scale.
Career Highlights
Throughout his career, Leijie Wang has worked with prestigious organizations that have enhanced his expertise and facilitated his innovations. He has spent time at Tsinghua University, one of the leading educational institutions in China, and has contributed to Beijing U-Precision Tech Co., Ltd., where he further developed his optical technologies.
Collaborations
In his journey as an inventor, Wang has collaborated with noteworthy colleagues including Yu Zhu and Ming Lei Zhang. These partnerships have allowed for a blend of ideas and innovations that have propelled his research and contributions in the field of optical engineering.
Conclusion
Leijie Wang stands out as a notable inventor in the realm of optical systems and photolithography. His patented inventions pave the way for advancements in precision measurement and manufacturing techniques. As he continues to innovate, Wang's work is expected to have a lasting impact on both academic and industrial practices within the field.
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