The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2024
Filed:
Oct. 23, 2020
Tsinghua University, Beijing, CN;
Beijing U-precision Tech Co., Ltd., Beijing, CN;
Leijie Wang, Beijing, CN;
Yu Zhu, Beijing, CN;
Ming Zhang, Beijing, CN;
Jitao Xu, Beijing, CN;
Xin Li, Beijing, CN;
Rong Cheng, Beijing, CN;
Kaiming Yang, Beijing, CN;
Jinchun Hu, Beijing, CN;
TSINGHUA UNIVERSITY, Beijing, CN;
BEIJING U-PRECISION TECH CO., LTD., Beijing, CN;
Abstract
A laser interference photolithography system, comprising a laser device, a first reflector, a grating beam-splitter, a second reflector, a first universal reflector, a first lens, a second universal reflector, a second lens, a beam splitting prism, a control module, an angle measurement module, a third lens and a substrate. The control module comprises a signal processing terminal, a controller, and a driver. The signal processing terminal is connected to the angle measurement module, the controller is connected to both the signal processing terminal and the driver, and the driver is connected to both the first universal reflector and the second universal reflector. The laser emits a laser light that is split into two beams of light by the system, and the two beams of light are focused on the substrate for exposure.