Beijing, China

Kaiming Yang

USPTO Granted Patents = 26 

Average Co-Inventor Count = 9.2

ph-index = 2

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2011-2025

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26 patents (USPTO):

Title: Innovations and Contributions of Kaiming Yang

Introduction: Kaiming Yang, located in Beijing, China, is an accomplished inventor with a remarkable portfolio of 24 patents. His contributions to the field of photolithography and optical technologies have significantly advanced the capabilities of precision measurements and manufacturing processes.

Latest Patents: Among his latest patents, the "Scanning interference lithographic system" stands out. This system features a heterodyne optical path and employs a motion platform alongside a control subsystem to achieve high precision in fringe pattern locking. It utilizes a displacement measurement interferometer to ensure accurate positioning, enabling the production of large-area, high-precision dense grating line gradient periodic gratings. Another notable patent is the "Vertical motion protection method and device based on dual-stage motion system of photolithography machine." This innovative method calculates the coordinates of measured points and compares them against a height threshold to ensure the safety and operational integrity of photolithography systems.

Career Highlights: Kaiming Yang has had an illustrious career, with significant engagements at reputable institutions such as Tsinghua University and Beijing U-Precision Tech Co., Ltd. His work within these organizations has contributed to advancements in the technology and applications of photolithography and optical systems.

Collaborations: Throughout his career, Kaiming Yang has collaborated with various talented individuals, including coworkers Yu Zhu and Ming Lei Zhang. These partnerships have fostered a creative environment that has propelled innovation and contributed to the development of groundbreaking technologies in the photolithography sector.

Conclusion: Kaiming Yang's contributions to innovations in photolithography reflect a robust blend of creativity, technical acumen, and collaboration. With a total of 24 patents, his work continues to influence advancements in precision manufacturing and optical technologies, establishing him as a noteworthy inventor in his field.

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