The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2025
Filed:
Oct. 23, 2020
Tsinghua University, Beijing, CN;
Beijing U-precision Tech Co., Ltd., Beijing, CN;
Leijie Wang, Beijing, CN;
Yu Zhu, Beijing, CN;
Ming Zhang, Beijing, CN;
Jitao Xu, Beijing, CN;
Rong Cheng, Beijing, CN;
Jiankun Hao, Beijing, CN;
Kaiming Yang, Beijing, CN;
Xin Li, Beijing, CN;
Siqi Gao, Beijing, CN;
Yujiao Fan, Beijing, CN;
Abstract
Disclosed is a scanning interference photolithography system, comprising a heterodyne optical path, a first interference optical path, a second interference optical path, a motion platform and a control subsystem, wherein a substrate is carried on the motion platform, a displacement measurement interferometer is used to measure the displacement of the motion platform, a first light beam and a second light beam are focused on the substrate for interference exposure; the control subsystem generates instructions according to various measurement information, adjusts angles of corresponding devices or the phase of a light beam, and locks the phase shift of interference exposure fringes of the first light beam and the second light beam. The system has a high precision of fringe pattern locking and a high laser utilization rate, and can be used for producing a large-area high-precision dense grating line gradient periodic grating.