Yujiao Fan

Title: Yujiao Fan: Innovator in Scanning Interference Lithography

Introduction

Yujiao Fan is a prominent inventor based in Beijing, China. He is known for his contributions to the field of photolithography, particularly through his innovative patent in scanning interference lithographic systems. His work has significant implications for high-precision manufacturing processes.

Latest Patents

Yujiao Fan holds a patent for a "Scanning interference lithographic system." This system includes a heterodyne optical path, a first and second interference optical path, a motion platform, and a control subsystem. The substrate is carried on the motion platform, and a displacement measurement interferometer is utilized to measure the platform's displacement. The system focuses two light beams on the substrate for interference exposure. The control subsystem generates instructions based on various measurement information, adjusting angles of corresponding devices or the phase of a light beam. This innovation boasts high precision in fringe pattern locking and a high laser utilization rate, making it suitable for producing large-area, high-precision dense grating line gradient periodic gratings.

Career Highlights

Yujiao Fan is affiliated with Tsinghua University, where he continues to advance research in photolithography and related technologies. His work has garnered attention for its potential applications in various high-tech industries.

Collaborations

Yujiao Fan collaborates with notable colleagues, including Leijie Wang and Yu Zhu, who contribute to his research endeavors and innovations.

Conclusion

Yujiao Fan's contributions to the field of photolithography through his innovative patent demonstrate his commitment to advancing technology. His work at Tsinghua University and collaborations with esteemed colleagues further enhance the impact of his inventions.