Jitao Xu

Title: **Innovative Contributions of Jitao Xu: A Spotlight on His Patents and Collaborations**

Introduction

Jitao Xu, an innovative inventor based in Beijing, China, has made significant contributions to the field of photolithography. With two patents to his name, Xu's work primarily revolves around advanced optical systems designed for high-precision applications.

Latest Patents

Xu's most notable inventions include a **Scanning Interference Lithographic System** and a **Laser Interference Photolithography System**. The scanning interference lithographic system features a complex structure including a heterodyne optical path, interference optical paths, and a control subsystem that effectively measures substrate displacement and controls the exposure process. This system boasts high precision in fringe pattern locking and increased laser utilization rates, making it suitable for producing large-area high-precision dense grating patterns.

Additionally, his laser interference photolithography system utilizes a laser device and a variety of optical components to split light for substrate exposure. The system includes a control module with a signal processing terminal, making it capable of precise light manipulation and exposure, which enhances the production of intricate patterns on substrates.

Career Highlights

Jitao Xu has had a fruitful career in academia and industry. He has worked at prestigious institutions such as **Tsinghua University** and **Beijing U-Precision Tech Co., Ltd.** These roles have allowed him to collaborate with other experts in the field and contribute to advancing photolithography technologies.

Collaborations

Throughout his career, Xu has collaborated with talented colleagues, including **Leijie Wang** and **Yu Zhu**. These partnerships have further enriched his inventions and helped to push the boundaries of innovation in optical systems.

Conclusion

Jitao Xu's inventive spirit and dedication to high-precision technologies have established him as a significant figure in the field of photolithography. His latest patents highlight his ability to integrate complex optical systems with precision engineering, paving the way for future innovations in the industry.