The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2025
Filed:
Oct. 23, 2020
Tsinghua University, Beijing, CN;
Beijing U-precision Tech Co., Ltd., Beijing, CN;
Leijie Wang, Beijing, CN;
Yu Zhu, Beijing, CN;
Ming Zhang, Beijing, CN;
Jitao Xu, Beijing, CN;
Rong Cheng, Beijing, CN;
Xin Li, Beijing, CN;
Kaiming Yang, Beijing, CN;
Jinchun Hu, Beijing, CN;
Tsinghua University, Beijing, CN;
Beijing U-Precision Tech Co., Ltd., Beijing, CN;
Abstract
An exposure light beam phase measurement method for laser interference photolithography comprises: separating a measurement light from an exposure light beam and inputting light into a laser phase measurement interferometer to carry out phase measurement on the exposure light beam; inputting a reference light beam homologous with the exposure light beam into the laser phase measurement interferometer; processing the reference light beam to form an interference measurement optical signal; calculating to obtain the phase of the exposure light beam. A laser interference photolithography system using the method comprises a laser phase measurement interferometer, a controller and phase modulators, the laser phase measurement interferometer measures whether the phase of an exposure light beam drifts, the controller controls phase modulators to carry out phase modulation, to achieve locking of exposure stripe phase drift and manufacturing of a high-precision variable-period optical grating.