The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 2025
Filed:
Jul. 01, 2021
Tsinghua University, Beijing, CN;
Beijing U-precision Tech Co., Ltd., Beijing, CN;
Leijie Wang, Beijing, CN;
Yu Zhu, Beijing, CN;
Ming Zhang, Beijing, CN;
Rong Cheng, Beijing, CN;
Yuezhu Yang, Beijing, CN;
Xin Li, Beijing, CN;
Kaiming Yang, Beijing, CN;
TSINGHUA UNIVERSITY, Beijing, CN;
BEIJING U-PRECISION TECH CO., LTD., Beijing, CN;
Abstract
A device and a method for regulating and controlling an incident angle of a light beam in a laser interference lithography process are disclosed. The device comprises: a beam splitter prism between a first lens and a second lens, a first position detector, a first decoupling lens between the first position detector and the beam splitter prism, a feedback control system connected to the first position detector and a first universal reflecting mirror. The beam splitter prism reflects first incident light passing through the first universal reflecting mirror, the first decoupling lens enables a first reflected light enter into the first position detector, the first position detector measures the light beam position, the feedback control system outputs a control command according to the measurement result to regulate a mirror base of the first universal reflecting mirror, thereby regulating and controlling an incident angle of an exposure light beam.