Yuezhu Yang

Title: Yuezhu Yang: Innovator in Laser Interference Lithography

Introduction

Yuezhu Yang is a notable inventor based in Beijing, China. He has made significant contributions to the field of laser interference lithography, particularly through his innovative patent. His work has implications for various applications in optics and photonics.

Latest Patents

Yuezhu Yang holds a patent titled "Device and method for regulating and controlling incident angle of light beam in laser interference lithography." This invention presents a device and method designed to regulate and control the incident angle of a light beam during the laser interference lithography process. The device includes a beam splitter prism positioned between a first lens and a second lens, a first position detector, and a feedback control system. The system is designed to measure the light beam position and output control commands to adjust the mirror base of a universal reflecting mirror, thereby ensuring precise regulation of the exposure light beam's incident angle. He has 1 patent to his name.

Career Highlights

Yuezhu Yang has worked at prestigious institutions, including Tsinghua University and Beijing U-Precision Tech Co., Ltd. His experience in these organizations has allowed him to collaborate with other experts in the field and contribute to advancements in technology.

Collaborations

Some of his notable coworkers include Leijie Wang and Yu Zhu, who have also contributed to various projects in the realm of laser technology and optics.

Conclusion

Yuezhu Yang's innovative work in laser interference lithography showcases his expertise and commitment to advancing technology in this field. His contributions are valuable to both academic and industrial applications.