Tsinghua University

Beijing U-Precision Tech Co., Ltd.

Yuezhu Yang

Xin Li

Yu Zhu

Kaiming Yang

Rong Cheng

Ming Zhang

Leijie Wang

A device and a method for regulating and controlling an incident angle of a light beam in a laser interference lithography process are disclosed. The device comprises: a beam splitter prism between a first lens and a second lens, a first position detector, a first decoupling lens between the first position detector and the beam splitter prism, a feedback control system connected to the first position detector and a first universal reflecting mirror. The beam splitter prism reflects first incident light passing through the first universal reflecting mirror, the first decoupling lens enables a first reflected light enter into the first position detector, the first position detector measures the light beam position, the feedback control system outputs a control command according to the measurement result to regulate a mirror base of the first universal reflecting mirror, thereby regulating and controlling an incident angle of an exposure light beam.

Device and method for regulating and controlling incident angle of light beam in laser interference lithography

Growing community of inventors

Beijing, China

Yuezhu Yang