Seongnam, South Korea

Kyoung-Sub Shin

This inventor holds 28 USPTO granted patents and 4 published patent applications, primarily in Semiconductor Manufacturing. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2010-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kyoung-Sub Shin. Retrieved from https://idiyas.com/inventor/kyoung-sub-shin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 28 

% Patents Active = 78.6

Average Co-Inventor Count = 3.0

ph-index = 5

Forward Citations = 78(Granted Patents)


Location History:

  • Gyeonggi-do, KR (2014 - 2015)
  • Seongnam-si, KR (2010 - 2023)

Company Filing History:


Years Active: 2010-2025

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Areas of Expertise:
FinFET
Vertical Memory Devices
Ion Beam Processing
Non-Volatile Memory
Charge Trap
Micropatterns
Etching Masks
Source/Drain Layers
Active Region Structure
Semiconductor Devices
Synchronous Pulse Plasma Etching
Substrate Processing
28 patents (USPTO):Explore Patents

Title: **Kyoung-Sub Shin: Innovator in Semiconductor Manufacturing**

Introduction

Kyoung-Sub Shin, based in Seongnam-si, South Korea, is a prolific inventor renowned for his contributions to the field of semiconductor manufacturing. With an impressive portfolio of 27 patents, Shin's work significantly impacts the technology sector, demonstrating his commitment to innovation and excellence.

Latest Patents

One of Shin's most recent patents involves advanced methods of manufacturing semiconductor devices by etching active fins using etching masks. In this innovative approach, first to third active fins are constructed on a substrate, each extending in a specific direction. The design allows for the careful removal of the second active fin utilizing a first etching mask, while a second etching mask facilitates the removal of the third active fin. Subsequently, a first gate structure is created on the first active fin, followed by the formation of a first source/drain layer adjacent to this structure. This patent exemplifies the cutting-edge techniques and precision involved in semiconductor device fabrication.

Career Highlights

Throughout his career at Samsung Electronics Co., Ltd., Kyoung-Sub Shin has consistently demonstrated a passion for innovation. His numerous patents highlight his ability to solve complex challenges in semiconductor technology, illustrating his expertise and forward-thinking approach within this dynamic industry.

Collaborations

Shin has worked closely with notable colleagues such as Dong-hyun Kim and Jun-ho Yoon. Their collaboration in various projects has contributed to the advancement of semiconductor technologies, showcasing the importance of teamwork in driving innovation in this competitive field.

Conclusion

Kyoung-Sub Shin's dedication to innovation in semiconductor manufacturing solidifies his reputation as a leading inventor in the industry. His extensive patent portfolio underscores his significant contributions and reflects the vital role that collaboration plays in fostering advancements in technology. As the semiconductor landscape evolves, innovators like Shin will continue to shape the future of this critical sector.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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