Kyoung-Keun Lee

Title: Kyoung-Keun Lee: Innovator in Transistor Technology

Introduction

Kyoung-Keun Lee is a prominent inventor based in Cary, NC (US), known for his significant contributions to the field of semiconductor technology. With a total of 10 patents to his name, he has made remarkable advancements in transistor design and fabrication methods.

Latest Patents

One of his latest patents is titled "Transistor including a discontinuous barrier layer." This invention features a transistor that incorporates a first passivation layer on a semiconductor layer, strategically placed between the source and drain contacts. The first passivation layer includes a portion with a topological change, and a discontinuous barrier layer is added to reduce moisture ingress. Another notable patent is "Plasma-based barrier layer removal method for increasing peak transconductance while maintaining on-state resistance and related devices." This patent describes a transistor device with a semiconductor structure that includes a channel layer and a barrier layer, along with source and drain contacts. The invention emphasizes the varying thicknesses of the barrier layer to enhance performance.

Career Highlights

Kyoung-Keun Lee has worked with notable companies in the semiconductor industry, including Wolfspeed, Inc. and Cree GmbH. His experience in these organizations has allowed him to develop innovative solutions that address critical challenges in transistor technology.

Collaborations

Throughout his career, Kyoung-Keun Lee has collaborated with talented professionals, including Fabian Radulescu and Scott Thomas Sheppard. These partnerships have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Kyoung-Keun Lee's work in transistor technology showcases his innovative spirit and dedication to advancing semiconductor design. His patents reflect a deep understanding of the complexities involved in creating efficient and reliable electronic components.