The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2026

Filed:

May. 20, 2021
Applicant:

Wolfspeed, Inc., Durham, NC (US);

Inventors:

Kyoung-Keun Lee, Cary, NC (US);

Fabian Radulescu, Chapel Hill, NC (US);

Scott Sheppard, Chapel Hill, NC (US);

Assignee:

Wolfspeed, Inc., Durham, NC (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10D 30/47 (2025.01); H01L 21/265 (2006.01); H01L 21/266 (2006.01); H10D 30/01 (2025.01); H10D 62/17 (2025.01); H10D 62/824 (2025.01); H10D 62/85 (2025.01);
U.S. Cl.
CPC ...
H10D 30/475 (2025.01); H10D 30/015 (2025.01); H10D 62/17 (2025.01); H01L 21/26546 (2013.01); H01L 21/266 (2013.01); H10D 62/824 (2025.01); H10D 62/8503 (2025.01);
Abstract

A transistor device ac includes a semiconductor epitaxial layer structure including a channel layer and a barrier layer on the channel layer, wherein the barrier layer has a higher bandgap than the channel layer, a source contact and a drain contact on the barrier layer, and a gate contact on the barrier layer between source contact and the drain contact. The device further includes a plurality of selective modified access regions at an upper surface of the barrier layer opposite the channel layer. The selective modified access regions include a material having a lower surface barrier height than the barrier layer, and the plurality of selective modified access regions are spaced apart on the barrier layer along a length of the gate contact.


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