Kyeong-Tae Lee

Title: Kyeong-Tae Lee: Innovator in Plasma Processing Technologies

Introduction

Kyeong-Tae Lee is a prominent inventor based in San Jose, CA, known for his significant contributions to plasma processing technologies. With a total of 7 patents, he has made remarkable advancements in methods that enhance the efficiency and effectiveness of plasma processing chambers.

Latest Patents

One of Kyeong-Tae Lee's latest patents is the "Ash rate recovery method in plasma strip chamber." This innovative method involves positioning a substrate within a processing volume of a chamber, where a silicon chloride residue is present. The process includes evaporating the silicon chloride residue and depositing it on the chamber's interior surfaces. Subsequently, the deposited silicon chloride is exposed to an oxidizing environment, converting it into a silicon oxide passivation layer. This method can utilize an oxygen-containing plasma or oxygen radicals to achieve the desired results.

Another notable patent is focused on "Methods to eliminate 'M-shape' etch rate profile in inductively coupled plasma reactor." This invention describes an inductively-coupled plasma processing chamber equipped with a ceiling and two adjacent antennas. The design ensures that the etch rate of the substrate remains uniform, enhancing the overall performance of the plasma processing system.

Career Highlights

Kyeong-Tae Lee is currently employed at Applied Materials, Inc., a leading company in the field of materials engineering. His work at Applied Materials has allowed him to push the boundaries of plasma processing technology, contributing to advancements that benefit various industries.

Collaborations

Throughout his career, Kyeong-Tae Lee has collaborated with several talented individuals, including Shashank C Deshmukh and Tae Won Kim. These collaborations have fostered an environment of innovation and creativity, leading to the development of cutting-edge technologies.

Conclusion

Kyeong-Tae Lee's contributions to plasma processing technologies through his patents and work at Applied Materials, Inc. highlight his role as a key innovator in the field. His advancements continue to influence the industry and pave the way for future innovations.