Kumiko Ono

Title: Kumiko Ono: Innovator in Etching Technology

Introduction

Kumiko Ono is a prominent inventor based in Miyagi, Japan, known for her significant contributions to the field of etching technology. With a total of eight patents to her name, she has made remarkable advancements that have influenced various industries.

Latest Patents

Among her latest patents are innovative methods for etching. One notable patent is an etching method that involves a physical adsorption process. This process physically adsorbs an adsorbate based on a first processing gas onto a film to be etched, under specific pressure conditions. The method also includes cooling the object to be processed while etching the film by reacting the adsorbate with the film using plasma from a second processing gas. Another significant patent is a plasma etching method that features a physisorption step, where an adsorbate based on the first processing gas is physisorbed onto the film to be etched. This method also utilizes plasma from a second processing gas to etch the film effectively.

Career Highlights

Kumiko Ono has worked with notable companies such as Tokyo Electron Limited and Université d'Orléans. Her experience in these organizations has allowed her to refine her skills and contribute to groundbreaking technologies in etching.

Collaborations

Throughout her career, Kumiko has collaborated with esteemed colleagues, including Hiroshi Tsujimoto and Koichi Nagami. These partnerships have fostered innovation and have been instrumental in her research and development efforts.

Conclusion

Kumiko Ono's work in etching technology showcases her dedication to innovation and her impact on the industry. Her patents reflect her expertise and commitment to advancing technology in meaningful ways.