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For the Inventor, By the Inventor

Campbell, CA, United States of America

Krystelle Lionti

This inventor holds 14 USPTO granted patents and 6 published patent applications. Top assignees: International Business Machines Corporation, Eindhoven University of Technology, The University of Melbourne. Active years: 2015-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Krystelle Lionti. Retrieved from https://idiyas.com/inventor/krystelle-lionti

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 14 

% Patents Active = 57.1

Average Co-Inventor Count = 4.8

ph-index = 2

Forward Citations = 7(Granted Patents)


Location History:

  • Campbell, CA (US) (2015 - 2021)
  • San Jose, CA (US) (2018 - 2023)

Company Filing History:

goldMedal14 out of 166,351 
 
International Business Machines Corporation
 patents
silverMedal2 out of 100 
 
Eindhoven University of Technology
 patents
bronzeMedal2 out of 330 
 
The University of Melbourne
 patents
4. 1 out of 10,904 
 
Tokyo Electron Limited
 patents
where one patent can have more than one assignee

Years Active: 2015-2026

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14 patents (USPTO):Explore Patents
1. 12588436 - Area selective deposition of hardmasks for vacuum gap formation (2026-03-24),
2. 12588261 - Selective deposition on metals using porous low-k materials (2026-03-24),
3. 12488994 - Magnesium oxide based hardmask for reactive ion etching (2025-12-02),
4. 12110592 - Generating metal-oxide film (2024-10-08),
5. 12099043 - Protective enclosure for gas sensors (2024-09-24),
6. 11624740 - Protective enclosure for gas sensors (2023-04-11),
7. 11371143 - Implementing the post-porosity plasma protection (P4) process using I-CVD (2022-06-28),
8. 11174412 - Surface modification by polymer anchoring on porous substrates (2021-11-16),
9. 10370556 - Surface modification by polymer anchoring on porous substrates (2019-08-06),
10. 10236184 - Porous tin oxide films (2019-03-19),
11. 10020199 - Porous tin oxide films (2018-07-10),
12. 9766170 - Determination of young'S modulus of porous thin films using ultra-low load nano-indentation (2017-09-19),
13. 9514929 - Dielectric filling materials with ionic compounds (2016-12-06),
14. 9214335 - Surface plasma modification of porous thin-films to optimize pore filling (2015-12-15),

Title: The Innovative Mind of Krystelle Lionti

Introduction: Krystelle Lionti, a talented inventor based in Campbell, CA, is known for his groundbreaking contributions to the field of technology and innovation. With a passion for creating solutions to complex problems, Lionti has established himself as a prominent figure in the world of patents and inventions.

Latest Patents: Krystelle Lionti's latest patents showcase his ingenuity and forward-thinking approach to innovation. His most recent inventions focus on enhancing communication technologies and improving efficiency in various industries.

Career Highlights: Throughout his illustrious career, Krystelle Lionti has received numerous accolades for his innovative work. His ability to think outside the box and develop unique solutions has led to significant advancements in the tech sector. Lionti's patents have revolutionized the way we approach challenges in the modern world.

Collaborations: Krystelle Lionti has collaborated with leading tech companies and research institutions to bring his inventions to life. His partnerships have been instrumental in turning his visionary ideas into tangible products that have had a lasting impact on society.

Conclusion: In conclusion, Krystelle Lionti's dedication to innovation and his relentless pursuit of excellence have solidified his reputation as a pioneering inventor. His contributions to the field of technology continue to inspire future generations of inventors and shape the way we interact with the world around us.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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