The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2015
Filed:
Apr. 24, 2014
International Business Machines Corporation, Armonk, NY (US);
Robert L. Bruce, White Plains, NY (US);
Geraud J. Dubois, Los Altos, CA (US);
Theo J. Frot, San Francisco, CA (US);
Krystelle Lionti, Campbell, CA (US);
Teddie P. Magbitang, San Jose, CA (US);
Willi Volksen, San Jose, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
The present invention describes a process to modify a top portion of a porous ultra low-k (ULK) material in order to maximize porosity filling with a filling material that initially displayed low compatibility with the ULK material. Surface modification is achieved by a plasma treatment, enhancing the compatibility between the ULK surface and the filling material. The invention obtains high filling levels with minimum modification to the ULK material, as only a thin top portion is modified without significant pore sealing.