The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2022
Filed:
May. 31, 2019
International Business Machines Corporation, Armonk, NY (US);
Tokyo Electron Limited, Tokyo, JP;
Krystelle Lionti, San Jose, CA (US);
Geraud Jean-Michel Dubois, Redwood City, CA (US);
Willi Volksen, Alpine, UT (US);
Jacques Faguet, Austin, TX (US);
International Business Machines Corporation, Armonk, NY (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
Provided is a pore-filling method for protecting the pores of a porous material. The method, which is performed using a modified i-CVD technique, involves filling the pores of a porous material with a gas phase monomer within a pressure chamber and subsequently polymerizing the monomer, both within the pores and on the surface of the material as an overburden. The method is solvent-free and can fill and protect pores of any size of any material.