Kosuke Horibe

Title: Kosuke Horibe - Innovator in Semiconductor Technology

Introduction

Kosuke Horibe is a prominent inventor based in Yokkaichi, Mie, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His work focuses on enhancing the performance and manufacturing processes of semiconductor devices.

Latest Patents

Among his latest patents is a semiconductor device featuring a multilayer insulating layer in a recess, along with a method for manufacturing it. This innovative device includes a stacking part with multiple conductor layers arranged in a z direction and a stair part extending in a y direction. The design incorporates a first insulating film and a second insulating film, with the latter having a higher linear expansion coefficient than the former. Another notable patent involves a semiconductor device that includes a first insulator made of silicon and oxygen, along with interconnects and a second insulator containing silicon, carbon, and nitrogen.

Career Highlights

Kosuke Horibe has worked with leading companies in the semiconductor industry, including Toshiba Memory Corporation and Kioxia Corporation. His experience in these organizations has allowed him to develop cutting-edge technologies that advance the capabilities of semiconductor devices.

Collaborations

Throughout his career, Horibe has collaborated with notable colleagues such as Kei Watanabe and Soichi Yamazaki. These partnerships have fostered innovation and contributed to the successful development of various semiconductor technologies.