Koji Tominaga

Title: Koji Tominaga: Innovator in Semiconductor Technology

Introduction

Koji Tominaga is a prominent inventor based in Kyoto, Japan, known for his significant contributions to semiconductor technology. With a total of 11 patents to his name, Tominaga has made remarkable advancements in the field, particularly in the manufacturing of metal compound thin films.

Latest Patents

Tominaga's latest patents include a semiconductor device and a method of manufacturing the same. One notable method involves forming a first metal compound layer on a substrate through atomic layer deposition. This process is followed by annealing the first metal compound layer in an atmosphere containing a nitrogen compound gas, which allows nitrogen to diffuse into the layer. Additionally, he has developed a method for manufacturing a metallic compound thin film that incorporates high-k dielectric metal, nitrogen, and oxygen. This method includes cleaning the substrate, forming an interface layer, and building a metal oxide film while controlling the leak current through specific annealing processes.

Career Highlights

Throughout his career, Tominaga has worked with reputable companies such as Horiba, Ltd. and Rohm Co., Ltd. His expertise in semiconductor technology has positioned him as a key figure in the industry, contributing to advancements that enhance the performance and reliability of electronic devices.

Collaborations

Tominaga has collaborated with notable coworkers, including Kunihiko Iwamoto and Toshihide Nabatame. Their combined efforts have led to innovative solutions in semiconductor manufacturing processes.

Conclusion

Koji Tominaga's work in semiconductor technology exemplifies the impact of innovation in modern electronics. His patents and collaborations reflect a commitment to advancing the field, making him a significant contributor to the industry.