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For the Inventor, By the Inventor

Kawasaki, Japan

KhanhTin Nguyen

This inventor holds 9 USPTO granted patents and 10 published patent applications. Top assignee: Tokyo Ohka Kogyo Co., Ltd.. Active years: 2019-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: KhanhTin Nguyen. Retrieved from https://idiyas.com/inventor/khanhtin-nguyen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 9 

% Patents Active = 100.0

Average Co-Inventor Count = 2.4

ph-index = 2

Forward Citations = 6(Granted Patents)


Company Filing History:

goldMedal9 out of 1,236 
 
Tokyo Ohka Kogyo Co., Ltd.
 patents

Years Active: 2019-2025

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9 patents (USPTO):Explore Patents
1. 12498635 - Resist composition, method of forming resist pattern, and compound (2025-12-16),
2. 12474637 - Resist composition, method of forming resist pattern, compound, and acid diffusion controlling agent (2025-11-18),
3. 11874601 - Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent (2024-01-16),
4. 11754922 - Resist composition and method of forming resist pattern (2023-09-12),
5. 11703756 - Resist composition and method of forming resist pattern (2023-07-18),
6. 11693316 - Resist composition and method of forming resist pattern (2023-07-04),
7. 11099479 - Resist composition, method of forming resist pattern, polymeric compound, and copolymer (2021-08-24),
8. 10414918 - Method of preparing polymer compound (2019-09-17),
9. 10295905 - Resist composition, method for forming resist pattern, and polymer compound (2019-05-21),

Title: Innovations of KhanhTin Nguyen

Introduction

KhanhTin Nguyen is a prominent inventor based in Kawasaki, Japan. He has made significant contributions to the field of resist compositions and methods of forming resist patterns. With a total of seven patents to his name, Nguyen's work is recognized for its innovative approaches and technical advancements.

Latest Patents

Nguyen's latest patents include a resist composition that features a base material component exhibiting changed solubility in a developing solution under the action of acid. This composition also includes a compound represented by General Formula (d0), where various groups can represent hydrogen atoms, hydroxy groups, halogen atoms, or alkyl groups. Additionally, his work on resist compositions and methods of forming resist patterns involves a resin component with a constitutional unit derived from a specific compound, showcasing his expertise in polymer chemistry.

Career Highlights

Nguyen is currently employed at Tokyo Ohka Kogyo Co., Ltd., where he continues to push the boundaries of innovation in his field. His career is marked by a commitment to developing advanced materials that enhance the performance of resist compositions.

Collaborations

Nguyen has collaborated with notable coworkers, including Masatoshi Arai and Yoshitaka Komuro. These partnerships have contributed to the successful development of his patented technologies.

Conclusion

KhanhTin Nguyen's contributions to the field of resist compositions and methods of forming resist patterns highlight his innovative spirit and dedication to advancing technology. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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