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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11754922 B1

PDFFull Text
Date of Patent:
Sep. 12, 2023

Filed:

Jun. 23, 2021

Resist composition and method of forming resist pattern

Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;

Inventors:

Masatoshi Arai, Kawasaki, JP;

KhanhTin Nguyen, Kawasaki, JP;

Assignee:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;

Attorney:

Knobbe, Martens, Olson & Bear, LLP

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/039 (2006.01); C08F 212/12 (2006.01); G03F 7/038 (2006.01); C08F 220/18 (2006.01); C08F 220/28 (2006.01); C08F 220/30 (2006.01); C08F 212/14 (2006.01); C08F 220/40 (2006.01); C08F 212/34 (2006.01); C08F 212/02 (2006.01);
U.S. Cl.
CPC ...
G03F 7/039 (2013.01); C08F 212/02 (2013.01); C08F 212/12 (2013.01); C08F 212/24 (2020.02); C08F 212/34 (2013.01); C08F 220/1808 (2020.02); C08F 220/1809 (2020.02); C08F 220/1811 (2020.02); C08F 220/283 (2020.02); C08F 220/301 (2020.02); C08F 220/40 (2013.01); G03F 7/038 (2013.01);
Abstract

A resist composition containing a resin component (A1) having a constitutional unit derived from a compound represented by General Formula (a01-1). In the formula, Wrepresents a polymerizable group-containing group, Crepresents a tertiary carbon atom, and Xrepresents a group that forms a monocyclic or polycyclic alicyclic group together with C, Rato Rarepresents a hydrocarbon group having 1 to 10 carbon atoms, which may have a substituent, or a hydrogen atom, or two or more of Rato Raare bonded to each other to form an aliphatic ring, not all of Rato Raare hydrogen atoms, n represents 0 or 1

Find Patent Forward Citations

Arai, Masatoshi. (2023). Resist composition and method of forming resist pattern (U.S. Patent No. 11754922). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11754922

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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