The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 21, 2019

Filed:

Jul. 17, 2017
Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Inventors:

Yoshitaka Komuro, Kawasaki, JP;

Masatoshi Arai, Kawasaki, JP;

Koshi Onishi, Kawasaki, JP;

KhanhTin Nguyen, Kawasaki, JP;

Takaya Maehashi, Kawasaki, JP;

Assignee:

TOKYO OHKA KOGYO CO., LTD., Kawasaki-Shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/30 (2006.01); C08F 220/30 (2006.01); C08F 222/10 (2006.01); G03F 7/039 (2006.01); G03F 7/038 (2006.01); C08F 18/02 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0392 (2013.01); C08F 18/02 (2013.01); C08F 220/30 (2013.01); C08F 222/10 (2013.01); G03F 7/0382 (2013.01); G03F 7/0397 (2013.01); G03F 7/30 (2013.01); H01L 21/02 (2013.01);
Abstract

A resist composition which generates an acid upon exposure and whose solubility on a developing solution changes under the action of the acid, including a polymer compound having units represented by formulas (a0-1), (a0-2), and (a0-3) in an amount of 0 to 10 mol %. In the formulas, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Vaand Vaare a divalent hydrocarbon group, nand neach are an integer of 0 to 2, Ra″ is a specific acid dissociable group, Vais a divalent linking group containing a hetero atom or a single bond, Rais a monovalent organic group, nis an integer of 0 to 3, and nis an integer of 1 to 3.


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