The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 16, 2024
Filed:
Jun. 21, 2021
Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent
Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;
KhanhTin Nguyen, Kawasaki, JP;
Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;
Abstract
A resist composition that contains a base material component exhibiting changed solubility in a developing solution under action of acid and a compound (D0) represented by General Formula (d0), in which R, R, R, and Reach independently represents a hydrogen atom, a hydroxy group, a halogen atom, or an alkyl group; alternatively, Rand R, Rand R, or Rand Rare bonded to each other to form an aromatic ring; Rrepresents a hydrogen atom or an alkyl group; Y represents a group that forms an alicyclic group together with a carbon atom *C; provided that at least one of the carbon atoms that form the alicyclic group is substituted with an ether bond, a thioether bond, a carbonyl group, a sulfinyl group, or a sulfonyl group; m represents an integer of 1 or more, and Mrepresents an m-valent organic cation.