Tokyo Ohka Kogyo Co., Ltd.

KhanhTin Nguyen

Masatoshi Arai

Yoshitaka Komuro

Koshi Onishi

Takaya Maehashi

Takuya Ikeda

Takahiro Kojima

Takashi Nagamine

Hideto Nito

Tatsuya Fujii

Issei Suzuki

Yuki Fukumura

Masafumi Fujisaki

Nobuhiro Michibayashi

Masahiro Shiosaki

A resist composition containing a base material component and a compound represented by General Formula (d0), in which in the formula, Rdrepresents a condensed cyclic group containing a condensed ring containing at least one aromatic rings, the condensed cyclic group having, as a substituent, an acid decomposable group which is decomposed under action of acid to form a polar group, Ydrepresents a divalent linking group or a single bond, Mrepresents an m-valent organic cation, and m represents an integer of 1 or more

Resist composition, method of forming resist pattern, compound, and acid diffusion controlling agent

A resist composition that contains a base material component exhibiting changed solubility in a developing solution under action of acid and a compound (D0) represented by General Formula (d0), in which R, R, R, and Reach independently represents a hydrogen atom, a hydroxy group, a halogen atom, or an alkyl group; alternatively, Rand R, Rand R, or Rand Rare bonded to each other to form an aromatic ring; Rrepresents a hydrogen atom or an alkyl group; Y represents a group that forms an alicyclic group together with a carbon atom *C; provided that at least one of the carbon atoms that form the alicyclic group is substituted with an ether bond, a thioether bond, a carbonyl group, a sulfinyl group, or a sulfonyl group; m represents an integer of 1 or more, and Mrepresents an m-valent organic cation.

Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent

A resist composition containing a resin component (A1) having a constitutional unit derived from a compound represented by General Formula (a01-1). In the formula, Wrepresents a polymerizable group-containing group, Crepresents a tertiary carbon atom, and Xrepresents a group that forms a monocyclic or polycyclic alicyclic group together with C, Rato Rarepresents a hydrocarbon group having 1 to 10 carbon atoms, which may have a substituent, or a hydrogen atom, or two or more of Rato Raare bonded to each other to form an aliphatic ring, not all of Rato Raare hydrogen atoms, n represents 0 or 1

Resist composition and method of forming resist pattern

A resist composition including a compound represented by formula (bd1), a total amount of the acid-generator component and the basic component being 20 to 70 parts by weight, relative to 100 parts by weight of the base material component. In the formula, Rxto Rxrepresents a hydrogen atom or a hydrocarbon group, or two or more of Rxto Rxmay be mutually bonded to form a ring structure; Ryand Ryrepresents a hydrogen atom or a hydrocarbon group, or Ryand Rymay be mutually bonded to form a ring structure; Rzto Rzrepresents a hydrogen atom or a hydrocarbon group, or two or more of Rzto Rzmay be mutually bonded to form a ring structure; provided that at least one of Rxto Rx, Ry, Ryand Rzto Rzhas an anionic group; and Mrepresents an m-valent organic cation).

A resist composition including a resin component having a constitutional unit derived from a compound represented by General Formula (a01-1) and a constitutional unit derived from a compound represented by General Formula (a02-1), and an acid generator component composed of an anion moiety and a cation moiety. In General Formula (a01-1), Wrepresents a polymerizable group-containing group, Crepresents a tertiary carbon atom, Rrepresents an unsaturated hydrocarbon group which may have a substituent, Rand Rrepresent a chain saturated hydrocarbon group which may have a substituent, and a carbon atom at an &#x3b1;-position of Cconstitutes a carbon-carbon unsaturated bond. In General Formula (a02-1), Wrepresents a polymerizable group-containing group, Warepresents an aromatic hydrocarbon group, and n2 represents an integer in a range of 1 to 3

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a polymeric compound having a structural unit represented by general formula (a0-1) (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Varepresents a divalent hydrocarbon group; nrepresents an integer of 0 to 2; Rarepresents an acid dissociable group represented by general formula (a0-r1-1); Raand Rarepresents a hydrocarbon group; Raand Ramay be mutually bonded to form a ring; Yarepresents a quaternary carbon atom; Ra, Raand Raeach independently represents a hydrocarbon group, provided that at least one of Ra, Raand Rais a hydrocarbon group having a polar group). 

Resist composition, method of forming resist pattern, polymeric compound, and copolymer

A method for preparing a polymer compound including copolymerizing a monomer (m0-1) and a monomer (m0-2) to obtain a first polymer compound and causing the first polymer compound and an acid component to react with each other to obtain a second polymer compound. In the formulae, Rand Rare each a hydrogen atom, an alkyl group having 1 to 5 carbon atoms and a halogenated alkyl group having 1 to 5 carbon atoms, Vais a divalent hydrocarbon group which may have an ether bond, nis an integer of 0 to 2, Rais a tertiary alkyl ester-type acid dissociable group, Vais a divalent linking group containing a heteroatom, or a single bond, Rais a monovalent organic group, nis an integer of 0 to 3, Rais an acid dissociable group, and nis an integer of 1 to 3. 

Method of preparing polymer compound

A resist composition which generates an acid upon exposure and whose solubility on a developing solution changes under the action of the acid, including a polymer compound having units represented by formulas (a0-1), (a0-2), and (a0-3) in an amount of 0 to 10 mol %. In the formulas, R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Vaand Vaare a divalent hydrocarbon group, nand neach are an integer of 0 to 2, Ra&#x2033; is a specific acid dissociable group, Vais a divalent linking group containing a hetero atom or a single bond, Rais a monovalent organic group, nis an integer of 0 to 3, and nis an integer of 1 to 3. 

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Kawasaki, Japan

KhanhTin Nguyen