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For the Inventor, By the Inventor

Mountain View, CA, United States of America

Kevin Vincent Moraes

This inventor holds 21 USPTO granted patents and 6 published patent applications. Top assignee: Applied Materials, Inc.. Active years: 2012-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kevin Vincent Moraes. Retrieved from https://idiyas.com/inventor/kevin-vincent-moraes

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 21 

% Patents Active = 81.0

Average Co-Inventor Count = 5.4

ph-index = 4

Forward Citations = 75(Granted Patents)


Location History:

  • Fremont, CA (US) (2012 - 2022)
  • Mountain View, CA (US) (2022 - 2024)

Company Filing History:

goldMedal21 out of 14,433 
 
Applied Materials, Inc.
 patents

Years Active: 2012-2026

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21 patents (USPTO):Explore Patents
1. 12680158 - Selective cobalt deposition on copper surfaces (2026-07-14),
2. 12176205 - Method and chamber for backside physical vapor deposition (2024-12-24),
3. 12142478 - Method and chamber for backside physical vapor deposition (2024-11-12),
4. 11959167 - Selective cobalt deposition on copper surfaces (2024-04-16),
5. 11637004 - Alignment module with a cleaning chamber (2023-04-25),
6. 11631813 - Deposition mask and methods of manufacturing and using a deposition mask (2023-04-18),
7. 11538706 - System and method for aligning a mask with a substrate (2022-12-27),
8. 11469096 - Method and chamber for backside physical vapor deposition (2022-10-11),
9. 11414740 - Processing system for forming layers (2022-08-16),
10. 11384429 - Selective cobalt deposition on copper surfaces (2022-07-12),
11. 11047039 - Substrate carrier having hard mask (2021-06-29),
12. 10707122 - Methods for depositing dielectric barrier layers and aluminum containing etch stop layers (2020-07-07),
13. 10109520 - Methods for depositing dielectric barrier layers and aluminum containing etch stop layers (2018-10-23),
14. 9660185 - Pattern fortification for HDD bit patterned media pattern transfer (2017-05-23),
15. 9612521 - Amorphous layer extreme ultraviolet lithography blank, and manufacturing and lithography systems therefor (2017-04-04),

Title: Kevin Vincent Moraes: Innovator in Backside Physical Vapor Deposition

Introduction

Kevin Vincent Moraes is an accomplished inventor based in Mountain View, CA, USA, with a remarkable portfolio of 20 patents. His work primarily focuses on advancements in manufacturing technologies, particularly in the realm of physical vapor deposition.

Latest Patents

One of Moraes' latest patents is titled "Method and chamber for backside physical vapor deposition." This innovative method addresses issues related to film stresses and bowing in substrates. The method involves flipping a substrate at a factory interface so that its backside faces up and transferring it to a physical vapor deposition chamber to deposit a film layer. Additionally, the apparatus designed for this process incorporates a substrate supporting surface that secures the substrate at its periphery without interfering with the active region on the front side.

Career Highlights

Kevin Moraes has made significant contributions during his tenure at Applied Materials, Inc., where he focuses on enhancing manufacturing techniques through his inventive solutions. His extensive experience and expertise have allowed him to develop technologies that improve the reliability and performance of substrate materials.

Collaborations

Moraes has collaborated with notable colleagues including Yong Cao and Xianmin Tang. Together, they work towards pushing the boundaries of innovation in their field, driving advancements in physical vapor deposition technologies and sharing insights that result in pioneering solutions.

Conclusion

Kevin Vincent Moraes continues to innovate in the field of manufacturing technology, particularly with his advancements in backside physical vapor deposition. As he builds on his impressive patent portfolio, his contributions serve to enhance the processes and materials used in modern manufacturing, securing his position as a leading inventor in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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