The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2023
Filed:
Mar. 02, 2020
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Kevin Moraes, Mountain View, CA (US);
Alexander N. Lerner, San Jose, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/00 (2006.01); C23C 14/04 (2006.01); C23C 14/02 (2006.01); C23C 14/12 (2006.01); H01L 51/42 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0011 (2013.01); C23C 14/022 (2013.01); C23C 14/042 (2013.01); C23C 14/12 (2013.01); H01L 51/42 (2013.01);
Abstract
Generally, examples described herein relate to deposition masks and methods of manufacturing and using such deposition masks. An example includes a method for forming a deposition mask. A mask layer is deposited on a substrate. Mask openings are patterned through the mask layer. A central portion of the substrate is removed to define a substrate opening through a periphery portion of the substrate. The mask layer with the mask openings through the mask layer extending across the substrate opening.