Tokyo, Japan

Keisuke Uchiyama

USPTO Granted Patents = 10 

 

Average Co-Inventor Count = 3.5

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2017-2024

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10 patents (USPTO):

Title: The Innovative Mind of Keisuke Uchiyama

Introduction

Keisuke Uchiyama is a prominent inventor based in Tokyo, Japan, renowned for his significant contributions to substrate cleaning technologies. With an impressive portfolio of 10 patents, Uchiyama's inventions play a crucial role in enhancing manufacturing processes, particularly in semiconductor production.

Latest Patents

Among Uchiyama's latest innovations are two notable patents:

1. **Substrate cleaning method and substrate cleaning apparatus** - This invention relates to a unique method for cleaning substrates, such as wafers. The process involves holding the substrate with specialized rollers, rotating it about its central axis, and delivering a two-fluid jet comprising a mixture of liquid and gas for efficient cleaning. Additionally, a fan-shaped jet of a second liquid complements this process, ensuring thorough cleansing of the substrate's surface.

2. **Substrate processing apparatus and storage medium having program stored therein** - This apparatus features a setting device that establishes various operational conditions for substrate processing. A recipe generating device collects multiple recipe models, analyzes them, and creates an optimized recipe that meets predetermined processing outcomes, enhancing the effectiveness of substrate treatment.

Career Highlights

Uchiyama has made significant strides in the engineering domain throughout his career. He has honed his skills by working at esteemed companies, including Ebara Corporation and Is Engineering Co., Ltd. His expertise has led to breakthroughs in substrate processing and cleaning technologies, which are vital for maintaining the high standards required in semiconductor manufacturing.

Collaborations

Throughout his journey, Uchiyama has collaborated with talented professionals in the field, including Yu Ishii and Kenya Ito. These collaborations have fostered an exchange of ideas and have been instrumental in the development of innovative solutions designed to tackle complex problems in substrate processing.

Conclusion

Keisuke Uchiyama's contributions to substrate cleaning and processing technologies highlight his expertise and innovative mindset. With a solid portfolio of patents and collaborations, he continues to influence the field of semiconductor manufacturing. As industries progress, Uchiyama's inventions are set to play a pivotal role in shaping the future of substrate processing technologies.

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