The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2024
Filed:
Jul. 13, 2020
Ebara Corporation, Tokyo, JP;
Kenji Kodera, Tokyo, JP;
Keisuke Uchiyama, Tokyo, JP;
Satoru Yamamoto, Tokyo, JP;
Hokuto Yamanobe, Tokyo, JP;
EBARA CORPORATION, Tokyo, JP;
Abstract
The present invention relates to a substrate cleaning method and a substrate cleaning apparatus for cleaning a substrate, such as a wafer. The substrate cleaning method includes: holding a periphery of a substrate (W) with holding rollers (); rotating the substrate (W) about its central axis by rotating the holding rollers () about their respective central axes; delivering a two-fluid jet from a two-fluid jet nozzle () to a surface of the substrate (W) while moving the two-fluid jet nozzle () in a radial direction of the substrate (W), the two-fluid jet () being composed of a mixture of a first liquid and a gas; and when the two-fluid jet is being delivered to the surface of the substrate (W), delivering a fan-shaped jet of a second liquid from a spray nozzle () to the surface of the substrate (W) to form a flow of the second liquid on the surface of the substrate (W). The fan-shaped jet is located away from the two-fluid jet.