Location History:
- Kanagawa, JP (2005 - 2009)
- Tokyo, JP (2003 - 2021)
Company Filing History:
Years Active: 2003-2021
Title: **Keiichi Ishikawa: Pioneer in Vacuum Technology**
Introduction
Keiichi Ishikawa, a prominent inventor based in Tokyo, Japan, has made significant contributions to the field of vacuum technology, particularly in semiconductor-device manufacturing. With a total of 13 patents to his name, Ishikawa has established himself as a key figure in the innovative advancements of vacuum systems.
Latest Patents
Ishikawa's latest inventions showcase his expertise in vacuum evacuation systems. One of his notable patents is the **Vacuum Evacuation System**, which pertains to a system that efficiently evacuates processing gases from multiple process chambers, essential in semiconductor-device manufacturing. This system employs several first vacuum pumps connected to respective process chambers, a collecting pipe, and a second vacuum pump, enhancing the operational efficiency of vacuum operations.
Another remarkable invention is the **Vacuum Pump with Abatement Function**. This innovation prevents contamination in process chambers by ensuring that exhaust gas treatment products do not flow back while effectively reducing the gas amounts required for treatment. The design incorporates a dry vacuum pump that utilizes a main pump and a booster pump to optimize evacuation speed and energy efficiency, thus minimizing the energy consumption necessary for exhaust gas treatment in the abatement section.
Career Highlights
Ishikawa is currently a renowned employee at Ebara Corporation, a leader in providing advanced technological solutions, especially in pumping and vacuum technology. His work at Ebara Corporation has allowed him to push the boundaries of vacuum systems, leading to inventions that significantly improve manufacturing processes.
Collaborations
Throughout his career, Keiichi Ishikawa has collaborated with industry professionals, including his coworkers Kohtaro Kawamura and Tetsuo Komai. These collaborations have fostered a creative environment that fuels innovation and technological advancement within the field of vacuum systems.
Conclusion
Keiichi Ishikawa stands out as a distinguished inventor whose contributions to vacuum technology have not only advanced semiconductor-device manufacturing but also demonstrated the importance of innovation in the industrial sector. His continued efforts in research and development hold the promise of further advancements in this critical area of technology.