The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2020

Filed:

Mar. 10, 2015
Applicant:

Ebara Corporation, Tokyo, JP;

Inventors:

Koichi Iwasaki, Tokyo, JP;

Hiroki Furuta, Tokyo, JP;

Keiichi Ishikawa, Tokyo, JP;

Tetsuo Komai, Tokyo, JP;

Shinichi Sekiguchi, Tokyo, JP;

Assignee:

EBARA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F04D 19/04 (2006.01); B01D 53/86 (2006.01); C23C 16/44 (2006.01); B01D 53/00 (2006.01); B01D 53/32 (2006.01);
U.S. Cl.
CPC ...
F04D 19/04 (2013.01); B01D 53/005 (2013.01); B01D 53/323 (2013.01); B01D 53/8659 (2013.01); B01D 53/8662 (2013.01); B01D 53/8671 (2013.01); C23C 16/4412 (2013.01); B01D 2257/2025 (2013.01); B01D 2257/2027 (2013.01); B01D 2257/2045 (2013.01); B01D 2257/2047 (2013.01); B01D 2257/2064 (2013.01); B01D 2257/2066 (2013.01); B01D 2257/553 (2013.01); B01D 2258/0216 (2013.01); F05D 2260/607 (2013.01); Y02C 20/30 (2013.01); Y02P 70/605 (2015.11);
Abstract

A vacuum pump with abatement function which can prevent contamination of a process chamber without allowing products generated by exhaust gas treatment to flow back to the process chamber, and can reduce the amount of gas to be treated without allowing a purge gas and a diluent gas to be contained in an exhaust gas, and thus can achieve energy saving by reducing the amount of energy required for the exhaust gas treatment in an abatement part is disclosed. The vacuum pump with abatement function includes a vacuum pump to which at least one abatement part for treating an exhaust gas is attached. The vacuum pump comprises a dry vacuum pump having a pair of multistage pump rotors each of which comprises a plurality of rotors arranged on a rotating shaft, and the at least one abatement part is connected to an interstage of the multistage pump rotors.


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