The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2004
Filed:
May. 01, 2002
Yoshiro Takemura, Fujisawa, JP;
Tetsuo Komai, Tokyo, JP;
Kotaro Kawamura, Tokyo, JP;
Takeshi Tsuji, Tokyo, JP;
Kazutaka Okuda, Tokyo, JP;
Rikiya Nakamura, Tokyo, JP;
Keiichi Ishikawa, Tokyo, JP;
Tomonori Ohashi, Tokyo, JP;
Yasutaka Muroga, Tokyo, JP;
Tadakazu Nishikawa, Tokyo, JP;
Yuji Shirao, Tokyo, JP;
Hiroyuki Yamada, Fujisawa, JP;
Ebara Corporation, Tokyo, JP;
Abstract
The present invention provides a burner for use in a combustion-type waste gas treatment system for combusting waste gases emitted from semiconductor manufacturing system, particularly, a deposition gas containing SiH and a halogen-base gas, simultaneously at a high efficiency of destruction, making it difficult for a powder of SiO to be attached and deposited, performing a low-NOx combustion, and maintaining a desired level of safety. The combustion-type waste gas treatment system has a flame stabilizing zone ( ), which is open toward a combustion chamber ( ), surrounded by a peripheral wall ( ), and closed by a plate ( ) remotely from the combustion chamber. A waste gas, an auxiliary combustible agent, and air are introduced into and mixed with each other in the flame stabilizing zone ( ), and the mixed gases are ejected toward the combustion chamber ( ) perpendicularly to the plate ( ).