Kazuto Ogawa

Title: Kazuto Ogawa: Innovator in Semiconductor Technology

Introduction

Kazuto Ogawa is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His innovative approaches have advanced the manufacturing processes of semiconductor devices.

Latest Patents

Ogawa's latest patents include a semiconductor device manufacturing method that involves preparing a target object with a multilayer film and a mask in a plasma processing apparatus. This multilayer film is created by alternately stacking silicon oxide and silicon nitride films. The etching process utilizes a processing gas that includes hydrogen gas, hydrogen bromide gas, nitrogen trifluoride gas, and at least one hydrocarbon gas, generating plasma to achieve the desired results. Another notable patent is a plasma processing method and apparatus that focuses on forming recess portions in multilayer films. This method employs a main etching process and an over etching process, utilizing a CF-based gas and oxygen gas to achieve precise etching depths.

Career Highlights

Throughout his career, Kazuto Ogawa has worked with leading companies in the semiconductor industry, including Tokyo Electron Limited and Toshiba Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor manufacturing.

Collaborations

Ogawa has collaborated with notable colleagues such as Kazuki Narishige and Takanori Sato. These partnerships have fostered an environment of innovation and creativity, leading to the development of advanced technologies in the semiconductor field.

Conclusion

Kazuto Ogawa's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the future of semiconductor manufacturing processes.