Company Filing History:

25 out of 5,975

Shin-etsu Chemical Co., Ltd.

Nec Electronics Corporation

5. 1 out of 832,843

Other

patents

where one patent can have more than one assignee

Years Active: 1999-2024

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37 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11934100 - Composition for forming silicon-containing resist underlayer film and patterning process (2024-03-19),

2. 11485824 - Thermosetting silicon-containing compound, composition for forming a silicon-containing film, and patterning process (2022-11-01),

3. 10444628 - Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process (2019-10-15),

4. 9971245 - Silicon-containing polymer, silicon-containing compound, composition for forming a resist under layer film, and patterning process (2018-05-15),

5. 9728420 - Organic film composition, process for forming organic film, patterning process, and compound (2017-08-08),

6. 8933251 - Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process (2015-01-13),

7. 8431323 - Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process (2013-04-30),

8. 8268528 - Resist composition and patterning process (2012-09-18),

9. 8252504 - Polymer, resist composition, and patterning process (2012-08-28),

10. 8101335 - Resist composition and patterning process (2012-01-24),

11. 8057981 - Resist composition, resist protective coating composition, and patterning process (2011-11-15),

12. 7701265 - Power-on reset circuit using flip-flop and semiconductor device having such power-on reset circuit (2010-04-20),

13. 7534554 - Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition (2009-05-19),

14. 7498126 - Photoacid generators, chemically amplified resist compositions, and patterning process (2009-03-03),

15. 7396633 - Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition (2008-07-08),

Title: Kazunori Maeda: Pioneering Inventor from Joetsu

Introduction: Kazunori Maeda is a renowned inventor hailing from Joetsu, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Maeda's latest patents include advancements in renewable energy technologies, artificial intelligence systems, and sustainable transportation solutions.

Career Highlights: With over two decades of experience in the industry, Maeda has a proven track record of developing cutting-edge inventions that have revolutionized various sectors.

Collaborations: Throughout his career, Maeda has collaborated with leading research institutions, universities, and tech companies to bring his innovative ideas to life and make a lasting impact on society.

Conclusion: Kazunori Maeda's dedication to pushing the boundaries of innovation continues to inspire the next generation of inventors and shape the future of technology.

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