The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2012
Filed:
Feb. 13, 2009
Yuji Harada, Joetsu, JP;
Jun Hatakeyama, Joetsu, JP;
Kazunori Maeda, Joetsu, JP;
Tomohiro Kobayashi, Joetsu, JP;
Yuji Harada, Joetsu, JP;
Jun Hatakeyama, Joetsu, JP;
Kazunori Maeda, Joetsu, JP;
Tomohiro Kobayashi, Joetsu, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
A polymer obtained through copolymerization of a monomer having a hexafluoroalcohol pendant whose hydroxyl moiety has been protected and a monomer having an acid labile group is useful as an additive to a photoresist composition for immersion lithography. When processed by immersion lithography, the resist composition exhibits good water repellency and water slip and produces few development defects.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile