The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 18, 2012

Filed:

Dec. 01, 2009
Applicants:

Yuji Harada, Joetsu, JP;

Jun Hatakeyama, Joetsu, JP;

Koji Hasegawa, Joetsu, JP;

Kazunori Maeda, Joetsu, JP;

Tomohiro Kobayashi, Joetsu, JP;

Inventors:

Yuji Harada, Joetsu, JP;

Jun Hatakeyama, Joetsu, JP;

Koji Hasegawa, Joetsu, JP;

Kazunori Maeda, Joetsu, JP;

Tomohiro Kobayashi, Joetsu, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/028 (2006.01); G03F 7/039 (2006.01); G03F 7/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

A resist composition is provided comprising (A) an additive polymer of acyl-protected hexafluoroalcohol structure, (B) a base polymer having a structure derived from lactone ring, hydroxyl group and/or maleic anhydride, the base polymer becoming soluble in alkaline developer under the action of acid, (C) a photoacid generator, and (D) an organic solvent. The additive polymer is transparent to radiation of wavelength up to 200 nm, and its properties can be tailored by a choice of the polymer structure.


Find Patent Forward Citations

Harada, Yuji. (2012). Resist composition and patterning process (U.S. Patent No. 8268528). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8268528

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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