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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9971245 B1

PDFFull Text
Date of Patent:
May. 15, 2018

Filed:

Dec. 03, 2015

Silicon-containing polymer, silicon-containing compound, composition for forming a resist under layer film, and patterning process

Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Tsutomu Ogihara, Jyoetsu, JP;

Takeru Watanabe, Jyoetsu, JP;

Kazunori Maeda, Jyoetsu, JP;

Assignee:

SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;

Attorney:

Oliff PLC

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/11 (2006.01); C08F 230/08 (2006.01); G03F 7/40 (2006.01); G03F 7/004 (2006.01); G03F 7/075 (2006.01); G03F 7/039 (2006.01); C08F 8/12 (2006.01); H01L 21/027 (2006.01); C08F 212/08 (2006.01); C08F 232/08 (2006.01); H01L 21/02 (2006.01); C08G 77/14 (2006.01); C08G 77/20 (2006.01); C08F 220/30 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C08F 8/12 (2013.01); C08F 212/08 (2013.01); C08F 220/30 (2013.01); C08F 230/08 (2013.01); C08F 232/08 (2013.01); C08G 77/14 (2013.01); C08G 77/20 (2013.01); G03F 7/0045 (2013.01); G03F 7/039 (2013.01); G03F 7/0758 (2013.01); G03F 7/40 (2013.01); H01L 21/0274 (2013.01); H01L 21/02123 (2013.01);
Abstract

The present invention provides a silicon-containing polymer which contains a repeating unit shown by the general formula (1-3) and one or more repeating units selected from repeating units shown by the general formulae (1-1) and (1-2) as a partial structure. There can be provided a composition for forming a silicon-containing resist under layer film, and a silicon-containing polymer and a silicon-containing compound to give the composition that is capable of forming a resist under layer film improved in adhesiveness in any resist pattern, regardless of negative development or positive development.

Find Patent Forward Citations

Ogihara, Tsutomu. (2018). Silicon-containing polymer, silicon-containing compound, composition for forming a resist under layer film, and patterning process (U.S. Patent No. 9971245). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9971245

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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