Location History:
- Ohme, JP (2001)
- Ome, JP (2001 - 2007)
- Akishima, JP (2002 - 2007)
- Hachioji, JP (1995 - 2010)
- Tokyo, JP (2008 - 2018)
- Tokyo-to, JP (2015 - 2020)
Company Filing History:
18 out of 42,485 
9 out of 3,781 
9 out of 3,192 Years Active: 1995-2020
Introduction
Katsuya Hayano is a prolific inventor based in Tokyo, Japan, with an impressive portfolio of 34 patents. His work primarily focuses on advancements in photomask technology, which plays a crucial role in the semiconductor manufacturing process. This article delves into his latest patents, career highlights, and collaborations with notable individuals and companies.
Latest Patents
One of Katsuya Hayano's latest patents revolves around a photomask and methods for manufacturing and correcting photomasks. The invention presents a halftone mask consisting of an assist pattern and a unique manufacturing method involving ArF excimer lasers as the exposing source. This process is designed for projection exposure using off-axis illumination. It retains the focal depth magnification effect while ensuring that the assist pattern is not resolved, resulting in a transferred image with high contrast. The photomask includes a main pattern that is transferred to a target surface and an assist pattern nearby that is not transferred, with both patterns composed of a semi-transparent film made from identical materials. This innovation is significant for enhancing the efficiency and effectiveness of photomask applications.
Career Highlights
Katsuya Hayano has built a remarkable career by working at esteemed companies such as Hitachi, Ltd. and Renesas Technology Corporation. At these organizations, he contributed to various projects that helped shape the future of semiconductor technologies. His expertise and innovations have established him as a key figure in the field.
Collaborations
Throughout his career, Katsuya has collaborated with talented professionals, including coworkers Norio Hasegawa and Fumio Murai. These teamwork efforts have undoubtedly fostered a creative environment, leading to the development of groundbreaking technologies and advancements within the industry.
Conclusion
Katsuya Hayano stands out as a leading inventor in the area of photomask technology, evidenced by his numerous patents and contributions to prominent companies. His latest innovations not only showcase his technical proficiency but also his commitment to pushing the boundaries of semiconductor manufacturing. As technology continues to evolve, Hayano's work will likely remain influential in shaping the industry for years to come.
Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.