The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2005
Filed:
Jan. 23, 2003
Norio Hasegawa, Hinode, JP;
Katsuya Hayano, Akishima, JP;
Shinji Kubo, Fussa, JP;
Yasuhiro Koizumi, Tokyo, JP;
Hironobu Takaya, Tokyo, JP;
Morihisa Hoga, Tokyo, JP;
Norio Hasegawa, Hinode, JP;
Katsuya Hayano, Akishima, JP;
Shinji Kubo, Fussa, JP;
Yasuhiro Koizumi, Tokyo, JP;
Hironobu Takaya, Tokyo, JP;
Morihisa Hoga, Tokyo, JP;
Renesas Technology Corp., Tokyo, JP;
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Abstract
The manufacturing time of a mask is shortened. In a defect inspection of a mask having a light-shielding portion composed of a resist film, the presence or absence of defects, such as burr and film loss of a resist pattern on the mask, and foreign matters, etc. is inspected by reading optical information on either or both of reflection light and transmission light with respect to inspection light irradiated to the mask by the use of a foreign-matter inspection system. More specifically, in the inspection of the mask, it is possible to perform the defect inspection without performing a comparison inspection that requires a great amount of measuring time and advanced techniques. Therefore, the inspecting process of the mask can be simplified, and also the inspecting time of the mask can be shortened.