This inventor holds 1 USPTO granted patent. Top assignees: Dai Nippon Printing Co., Ltd., Renesas Technology Corp.. Active years: 2005.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:

Years Active: 2005
Title: Hironobu Takaya: Innovator in Semiconductor Manufacturing
Introduction
Hironobu Takaya is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patent that enhances the efficiency of mask production.
Latest Patents
Hironobu Takaya holds a patent titled "Method of manufacturing mask and method of manufacturing semiconductor integrated circuit device." This invention focuses on shortening the manufacturing time of a mask. The patent describes a defect inspection process for masks that utilize a light-shielding portion made of a resist film. By employing a foreign-matter inspection system, the presence of defects such as burrs, film loss, and foreign materials can be detected through optical information from reflection and transmission light. This method simplifies the inspection process and reduces the time required for mask inspection.
Career Highlights
Throughout his career, Hironobu Takaya has worked with prominent companies in the technology sector. He has been associated with Renesas Technology Corporation and Dai Nippon Printing Co., Ltd. His experience in these organizations has contributed to his expertise in semiconductor manufacturing and innovation.
Collaborations
Hironobu Takaya has collaborated with notable colleagues, including Shinji Kubo and Morihisa Hoga. Their joint efforts in the field of semiconductor technology have further advanced the industry.
Conclusion
Hironobu Takaya's contributions to semiconductor manufacturing through his innovative patent demonstrate his commitment to enhancing production efficiency. His work continues to influence the field and showcases the importance of innovation in technology.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile