Shinji Kubo

Title: Innovations by Shinji Kubo

Introduction

Shinji Kubo is a notable inventor based in Fussa, Japan. He has made significant contributions to the field of semiconductor technology, holding two patents that enhance the efficiency of semiconductor integrated circuit devices.

Latest Patents

Kubo's latest patents include a fabrication method of semiconductor integrated circuit devices and a mask fabrication method. The first patent focuses on shortening the mask fabrication time by patterning an electron-sensitive resist film on a mask substrate. A pellicle is mounted on the substrate immediately after forming a resist pattern, allowing for the removal of defects without removing the pellicle, thus streamlining the process. The second patent addresses the manufacturing time of a mask by simplifying the defect inspection process. It allows for the inspection of defects in a resist film without requiring extensive measuring time or advanced techniques, thereby reducing the overall inspection time.

Career Highlights

Shinji Kubo has worked with prominent companies such as Renesas Technology Corporation and Dai Nippon Printing Co., Ltd. His experience in these organizations has contributed to his expertise in semiconductor technology and innovation.

Collaborations

Kubo has collaborated with notable coworkers, including Norio Hasegawa and Katsuya Hayano, further enhancing his work in the field.

Conclusion

Shinji Kubo's innovative patents and career achievements reflect his significant impact on semiconductor technology. His work continues to influence the efficiency of integrated circuit devices and mask fabrication processes.