The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2007
Filed:
Jan. 23, 2004
Norio Hasegawa, Hinode, JP;
Katsuya Hayano, Akishima, JP;
Shinji Kubo, Fussa, JP;
Yasuhiro Koizumi, Sayama, JP;
Yasushi Kawai, Kawagoe, JP;
Norio Hasegawa, Hinode, JP;
Katsuya Hayano, Akishima, JP;
Shinji Kubo, Fussa, JP;
Yasuhiro Koizumi, Sayama, JP;
Yasushi Kawai, Kawagoe, JP;
Renesas Technology Corp., Tokyo, JP;
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Abstract
A mask fabrication time is shortened. By patterning an electron-sensitive resist film coated on a main surface of a mask substrate, a pellicle is mounted on the main surface of the mask substrate immediately after a resist pattern made from an electron beam sensitive resist film and having light-shielding characteristics with respect to exposure light is formed. Subsequently, by irradiating a laser beam to defect made from the electron beam sensitive resist film with the pellicle being mounted on the mask substrate, the defect is removed. Since the defect can be removed without removing the pellicle, the mask fabrication time can be shortened.