The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 06, 2007
Filed:
Feb. 04, 2004
Applicants:
Norio Hasegawa, Nishitama, JP;
Akira Imai, Hachiouji, JP;
Katsuya Hayano, Ome, JP;
Inventors:
Assignee:
Renesas Technology Corp., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03C 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
To alleviate the absolute value control accuracy of phases in a mask having a groove shifter structure, transfer regions formed at different planar positions on the same plane of the same mask are subjected to a multiple exposure by scanning exposure. Although identical mask patterns are formed over the transfer regions respective groove shifters provided to these mask patterns are arranged opposite from each other.
Hasegawa, Norio. (2007). Method of manufacturing semiconductor integrated circuit devices (U.S. Patent No. 7172853). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7172853
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile