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For the Inventor, By the Inventor

Sagamihara, Japan

Katsuhiko Murakami

This inventor holds 30 USPTO granted patents and 5 EPO patents, primarily in EUV Lithography Technology. Top assignees: Nikon Corporation, Nkk Corporation, Bunka Shutter Co., Ltd.. Active years: 1991-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Katsuhiko Murakami. Retrieved from https://idiyas.com/inventor/katsuhiko-murakami

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 30

% Patents Active = 93.3

 

Average Co-Inventor Count = 1.8

ph-index = 10

Forward Citations = 437(Granted Patents)


Location History:

  • Kawasaki, JP (1993 - 2003)
  • Kanagawa, JP (1996 - 2008)
  • Sagamihara, JP (2003 - 2018)
  • Tokyo, JP (1991 - 2023)

Company Filing History:

goldMedal25 out of 8,995 
 
Nikon Corporation
 patents
silverMedal3 out of 614 
 
Nkk Corporation
 patents
bronzeMedal2 out of 11 
 
Bunka Shutter Co., Ltd.
 patents
4. 2 out of 12 
 
Japan Marine Science and Technology Center
 patents
5. 2 out of 4,980 
 
Oki Electric Industry Co., Ltd.
 patents
where one patent can have more than one assignee

Years Active: 1991-2025

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Areas of Expertise:
EUV Light Source
Multilayer Mirror
Exposure Apparatus
Semiconductor Manufacturing
Reflective Mirrors
Optical Elements
X-ray Microlithography
Vacuum Chamber
High-luminosity Devices
Reflection Masks
Optical Systems
Casting Nozzle
30 patents (USPTO):Explore Patents
1. 12276155 - Connecting fitting construction materials and connecting method therefor (2025-04-14),
2. 11746585 - Connection member for construction materials, connecting fitting therefor, connecting structure therefor, and connecting method therefor (2023-09-05),
3. 10126660 - Multilayer film reflector, method of manufacturing multilayer film reflector, projection optical system, exposure apparatus, and method of manufacturing device (2018-11-13),
4. 8809818 - EUV light source, EUV exposure apparatus, and electronic device manufacturing method (2014-08-19),
5. 8121254 - Optical element, exposure apparatus using this, and device manufacturing method (2012-02-21),
6. 7741616 - EUV light source, EUV exposure equipment, and semiconductor device manufacturing method (2010-06-22),
7. 7706058 - Multilayer mirror, method for manufacturing the same, and exposure equipment (2010-04-27),
8. 7456417 - Laser plasma EUV light source, target material, tape material, a method of producing target material, a method of providing targets, and an EUV exposure device (2008-11-25),
9. 7440182 - Multilayer mirror, method for manufacturing the same, and exposure equipment (2008-10-21),
10. 7417708 - Extreme ultraviolet exposure apparatus and vacuum chamber (2008-08-26),
11. 7385212 - Collector optical system, light source unit, illumination optical apparatus, and exposure apparatus (2008-06-10),
12. 7382527 - EUV multilayer mirror with phase shifting layer (2008-06-03),
13. 6909774 - Apparatus and methods for surficial milling of selected regions on surfaces of multilayer-film reflective mirrors as used in X-ray optical systems (2005-06-21),
14. 6861656 - High-luminosity EUV-source devices for use in extreme ultraviolet (soft X-ray) lithography systems and other EUV optical systems (2005-03-01),
15. 6522717 - Reflective-type soft x-ray microscope (2003-02-18),

Title: Katsuhiko Murakami: Pioneering Inventor from Sagamihara

Introduction: Katsuhiko Murakami is a renowned inventor hailing from Sagamihara, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Murakami's latest patents include advancements in artificial intelligence algorithms for autonomous vehicles, wearable technology for healthcare monitoring, and sustainable energy solutions.

Career Highlights: With over two decades of experience in research and development, Murakami has worked with leading tech companies in Japan, spearheading projects that have revolutionized various industries.

Collaborations: Throughout his career, Murakami has collaborated with top universities and research institutions worldwide, fostering a culture of innovation and knowledge sharing.

Conclusion: Katsuhiko Murakami's dedication to pushing the boundaries of technology and his passion for creating solutions that improve lives make him a true visionary in the world of inventions.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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