Company Filing History:

25 out of 8,898

Nikon Corporation

Japan Marine Science and Technology Center

patents

4. 2 out of 4,979

Oki Electric Industry Co., Ltd.

patents

5. 2 out of 11

Bunka Shutter Co., Ltd.

patents

where one patent can have more than one assignee

Years Active: 1991-2025

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30 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12276155 - Connecting fitting construction materials and connecting method therefor (2025-04-14),

2. 11746585 - Connection member for construction materials, connecting fitting therefor, connecting structure therefor, and connecting method therefor (2023-09-05),

3. 10126660 - Multilayer film reflector, method of manufacturing multilayer film reflector, projection optical system, exposure apparatus, and method of manufacturing device (2018-11-13),

4. 8809818 - EUV light source, EUV exposure apparatus, and electronic device manufacturing method (2014-08-19),

5. 8121254 - Optical element, exposure apparatus using this, and device manufacturing method (2012-02-21),

6. 7741616 - EUV light source, EUV exposure equipment, and semiconductor device manufacturing method (2010-06-22),

7. 7706058 - Multilayer mirror, method for manufacturing the same, and exposure equipment (2010-04-27),

8. 7456417 - Laser plasma EUV light source, target material, tape material, a method of producing target material, a method of providing targets, and an EUV exposure device (2008-11-25),

9. 7440182 - Multilayer mirror, method for manufacturing the same, and exposure equipment (2008-10-21),

10. 7417708 - Extreme ultraviolet exposure apparatus and vacuum chamber (2008-08-26),

11. 7385212 - Collector optical system, light source unit, illumination optical apparatus, and exposure apparatus (2008-06-10),

12. 7382527 - EUV multilayer mirror with phase shifting layer (2008-06-03),

13. 6909774 - Apparatus and methods for surficial milling of selected regions on surfaces of multilayer-film reflective mirrors as used in X-ray optical systems (2005-06-21),

14. 6861656 - High-luminosity EUV-source devices for use in extreme ultraviolet (soft X-ray) lithography systems and other EUV optical systems (2005-03-01),

15. 6522717 - Reflective-type soft x-ray microscope (2003-02-18),

Title: Katsuhiko Murakami: Pioneering Inventor from Sagamihara

Introduction: Katsuhiko Murakami is a renowned inventor hailing from Sagamihara, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Murakami's latest patents include advancements in artificial intelligence algorithms for autonomous vehicles, wearable technology for healthcare monitoring, and sustainable energy solutions.

Career Highlights: With over two decades of experience in research and development, Murakami has worked with leading tech companies in Japan, spearheading projects that have revolutionized various industries.

Collaborations: Throughout his career, Murakami has collaborated with top universities and research institutions worldwide, fostering a culture of innovation and knowledge sharing.

Conclusion: Katsuhiko Murakami's dedication to pushing the boundaries of technology and his passion for creating solutions that improve lives make him a true visionary in the world of inventions.

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5 patents (EPO):

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5 patents pending (EPO):

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