The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2014
Filed:
Nov. 30, 2009
Applicant:
Katsuhiko Murakami, Sagamihara, JP;
Inventor:
Katsuhiko Murakami, Sagamihara, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05G 2/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Provided is an EUV light source which brings a target into the plasma state to radiate EUV light from the generated plasma. The target is one of a plurality of discrete targets. The surface area of each target is 1.5 times or more of that of a sphere which has the same material and the same mass as those of the target.