The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 26, 2008

Filed:

Apr. 20, 2005
Applicant:

Katsuhiko Murakami, Sagamihara, JP;

Inventor:

Katsuhiko Murakami, Sagamihara, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/54 (2006.01);
U.S. Cl.
CPC ...
Abstract

An extreme ultraviolet exposure apparatus comprising a light source that emits extreme ultraviolet light, a plurality of illumination reflective mirrors that direct the extreme ultraviolet light emitted from the light source to a mask, a plurality of projection reflective mirrors that direct the extreme ultraviolet light reflected by the mask onto a sensitive substrate and that project and focus an image of the mask on this sensitive substrate, and a projection system optical housing that accommodates at least one of the projection reflective mirrors and at least one of the illumination reflective mirrors.


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