The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2018
Filed:
Jan. 05, 2016
Applicant:
Nikon Corporation, Tokyo, JP;
Inventors:
Noriaki Kandaka, Sagamihara, JP;
Katsuhiko Murakami, Sagamihara, JP;
Assignee:
NIKON CORPORATION, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03F 7/20 (2006.01); G02B 5/08 (2006.01); G21K 1/06 (2006.01);
U.S. Cl.
CPC ...
G03F 7/702 (2013.01); G02B 5/0816 (2013.01); G02B 5/0891 (2013.01); G03F 7/70316 (2013.01); G03F 7/70958 (2013.01); G21K 1/062 (2013.01);
Abstract
A multilayer film reflector is a multilayer film reflector that includes a first uniform period multilayer film, an adjustment layer, and a second uniform period multilayer film in this order from a substrate side. A combination of the following (a) to (c) is set to each region or each position within a reflection surface. (a) Reflection characteristics of the single first uniform period multilayer film, (b) reflection characteristics of the single second uniform period multilayer film, and (c) a film thickness of the adjustment layer.